磁性薄膜生长的元胞自动机模拟  

Cellular Automata Simulation of Magnetic Thin Film Growth Process

作　　者：吴保磊[1] 廖聪维[1] 王昊[1] 叶雪枫[1] 杨晓非[1] 

机构地区：[1]华中科技大学电子科学与技术系,武汉430074

出　　处：《信息记录材料》2006年第5期39-42,46,共5页Information Recording Materials

基　　金：国家自然科学基金资助项目(60571010)

摘　　要：采用原子嵌入势,用元胞自动机方法模拟了铁(001)面上的薄膜生长。研究了溅射原子的沉积、迁移扩散和再蒸发3个主要的过程。发现溅射功率和基底温度对薄膜表面所形成岛核的形态影响很大,定量计算了当溅射功率和基底温度变化时岛的均匀度。给出了对于实验有指导意义的结论。Based on Embedded Atom Method （EAM} theory, Fe thin film growth with bcc structure, was simulated using Cellular Automata （CA） method on Computer. In our model, three processes were considered： particle deposition, adatom diffusion and adatom reevaporation. The simulation showed that the island morphology of the film surface was greatly affected by sputtering power and substrate temperature. The islands uniformity at different temperature and sputtering power has been calculated. The results could be used as useful guide line for thin film deposition experiments.

关 键 词：元胞自动机 原子嵌入势 Fe薄膜生长 

分 类 号：TQ584.2[化学工程—精细化工]