中频磁控溅射法制备厚类金刚石碳膜  

Thick Diamond-like Carbon Film Deposited Using Mid-frequency Magnetron Sputtering

作　　者：于翔[1] 刘阳 王成彪[1] 于德洋 

机构地区：[1]中国地质大学(北京)工程技术学院表面工程研究所,北京100083 [2]北京实力源科技开发有限公司,北京100072

出　　处：《润滑与密封》2006年第10期25-28,共4页Lubrication Engineering

基　　金：国家自然科学基金项目(50475057);清华大学摩擦学国家重点实验室开放基金项目(SKLT04-02);中国地质大学(北京)科学钻探国家专业实验室基金项目(200502)

摘　　要：采用中频对靶磁控法在M2高速钢基片上合成了厚达6μm的含铬类金刚石碳(DLC)薄膜,初步考察了中频磁控溅射工艺参数、DLC薄膜的多层梯度结构及薄膜力学和摩擦性能间的关系。结果表明,薄膜表面平滑,具有致密的多层梯度结构,在2.45 N载荷下维氏硬度为HV 2 560,结合力的临界载荷为52 N,且在较长滑动距离内平均摩擦因数为0.09。Chromium-doped diamond-like carbon （DLC） film,thickness up to 6 μm,was deposited on M2 high-speed substrate using a mid-frequency dual-magnetron sputtering. A relationship among the process parameters of the mid-frequency magnetron sputtering, the graded and multilayered structure of the DLC film, and the mechanical and frictional properties of the DLC film was elementarily investigated. Results show that the film has a smooth surface, a dense graded and multilayered structure, a Vickers hardness of HV 2 560 at a load of 2.45 N, a critical load of 52 N and an average friction coefficient of 0.09 kept in a long sliding endurance.

关 键 词：含铬类金刚石碳膜 梯度多层结构 中频对靶磁控溅射 

分 类 号：TB383[一般工业技术—材料科学与工程]