光催化氧化苯甲酸中毒机理的研究  

Study of photocatalytic deactivation mechanism during photooxidation of benzoic acid

作　　者：王永强[1] 于秀娟[1] 孙德智[1] 明琪[1] 杨红芬[1] 

机构地区：[1]哈尔滨工业大学市政环境工程学院,黑龙江哈尔滨150090

出　　处：《功能材料》2006年第10期1581-1583,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50378027)

摘　　要：采用强化中毒的方法,详细的研究了光催化剂的中毒过程,并利用TEM、XPS、SPS和IR对催化剂进行了表面物化特性以及强化中毒产物的分析。结果表明:随着催化剂的反复使用,其SPS信号强度逐渐增强,光催化活性逐渐降低,反复使用20次后催化活性基本消失。中毒后的催化剂出现明显的颗粒团聚以及碳积累现象,其中羟基氧以及—CH2—和—CH2OH碳的含量明显增多,综合分析认为主要中毒产物为苯甲酸、羟基苯甲酸、顺丁烯二酸及反丁烯二酸等有机酸类化合物。The strengthening poisoning of catalysis was used to investigate the process of deactivation of photocatalyst. The changes of the structure and chemical states of the catalysis have been characterized using TEM, XPS, SPS and IR. The results indicate that the photocatalytic active reduced as well as the increase of SPS during the reaction. The catalyst was deactivated after 20 times. The deactivation catalysis shows aggregation and carbon accumulation, at the same time hydroxide oxygen and the carbon in the -CH2- and -CH2OH functional groups increase greatly. The main poisoning compounds are benzoic acid, hydroxide benzoic acid, maleic acid and fumaric.

关 键 词：TIO2 光催化氧化 催化剂中毒 苯甲酸 

分 类 号：O643[理学—物理化学]