一种新的微型PTC元件的制造工艺  

A New Making Process of PTC Small Sensors

作　　者：简家文[1] 陶明德[1] 韩英[1] 

机构地区：[1]中国科学院新疆物理研究所

出　　处：《电子元件与材料》1996年第6期51-54,共4页Electronic Components And Materials

摘　　要：介绍了一种新的微型ＰＴＣ元件的制造工艺，并对各个工序的技术重点做了详细阐述。作者采用等静压成型和切片、划片新工艺制成２ｍｍ×２ｍｍ×０．３ｍｍ微型ＰＴＣ元件，其居里温度为１２０℃，室温电阻率为１００Ω·ｃｍ，升阻比ρｍａｘ／ρｍｉｎ大于１０３，电阻温度系数α≥１５％℃－１，时间常数小于２ｓ。A new making process of PTC small sensors is introduced and technological focal points in operations are detailed PTC small sensors (2 mm×2 mm×0 3 mm)with Curie temperature 120 ℃,resistivity at room temperature about 100 ohm·cm, temperature coefficient of resistance above 15% ℃ -1 ,rate of rise of resistivity ρ max / ρ min above 10 3 and time constant below 2 seconds have been made by use of new technology of isohydraulic formation, chip cut and scratch.

关 键 词：微型 PTC元件 制造工艺 电子元件 

分 类 号：TN605[电子电信—电路与系统]