锑中痕量砷的原子荧光光谱分析  

Analysis of trace arsenic in antimony by atomic fluorescence spectrometry

作　　者：刘卫[1] 胡世文[1] 

机构地区：[1]中国地质科学院矿产综合利用研究所,四川成都610041

出　　处：《冶金分析》2006年第5期69-71,共3页Metallurgical Analysis

摘　　要：采用原子荧光光谱法对锑中痕量砷的测定进行了研究。用王水溶解样品,三氯化钛还原砷(Ⅴ)为砷(Ⅲ)后,用苯萃取三氯化砷,碘化钾溶液洗涤有机相,水反萃取后原子荧光光谱法测定砷,大量锑和28种其他共存离子不干扰测定,方法检出限为3.4×10-9g/L,回收率在95.2%～105.0%之间,相对标准偏差为1.40%。本法已应用于金锑共生矿的冶金工艺流程试验样品和产品锑中痕量砷的测定。An atomic fluorescence spectrometry（AFS）for the detemination of trace arsenic in antimony was studied. The samples are dissolved in aqua regia, After As（Ⅴ） is reducted to As（Ⅲ） with TiCl3, AsCl3 is extracted into benzene, wich is washed with KI - HCl mixed solution and re-extracted with water. At last the fluorescence intensity is measured. Large amounts of antimony and twenty-eight other coexisting ions do not interfere. The detection limit for As was 3.4 × 10^-9 g/L. The method has been used for the determination of trace arsenic in antimony samples from metallurgical technological process of gold-antimony mixed minerals and antimony products with recovery of 95.2 % - 105.0 % and RSD of 1.40 %.

关 键 词：原子荧光光谱法 锑 痕量砷 

分 类 号：O657.31[理学—分析化学]