超声波化学沉积Co-Ni-B-Ce合金薄膜工艺的研究  

Study on Ultrasonic Chemical Depositing Co-Ni-B-Ce Alloy Film Process

作　　者：张路长[1] 宣天鹏[1] 冯书争[1] 

机构地区：[1]合肥工业大学材料科学与工程学院,安徽合肥230009

出　　处：《电镀与精饰》2006年第6期5-8,共4页Plating & Finishing

基　　金：国家自然科学基金资助项目(50371023)

摘　　要：研究了超声波条件下工艺参数对Co-N i-B-Ce合金化学沉积速度的影响,讨论了温度、声强、超声波频率、镀液组成等对沉积速度的影响。研究发现:温度、超声波频率、镀液组成对沉积速度有较大的影响。超声波使Co-N i-B-Ce化学沉积速度提高30%,在超声条件下,镀液的稳定性降低。随着声强的增加,镀液容易发生自分解,沉积速度迅速减小。通过对工艺的分析,得出了Co-N i-B-Ce合金超声波化学沉积的最佳工艺参数。The effects of ultrasonic chemical deposition process parameters on deposition rate of Co-Ni-B-Ce alloy film were investigated. Effects of temperature, sound intensity, frequency, concentration of each component in the solution were discussed. The results show that temperature, ultrasonic frequency, concentration of each component in the solution affect chemical deposition rate considerably. Chemical deposition rate of Co-Ni-B-Ce is increased by nearly 30 percent under ultrasonic waves. On the other hand the stability of the solution is decreased under ultrasonic waves. As the sound intensity increases, self-decomposition of the solution becomes easier. As a result, the deposition rate is decreased swiftly. The best parameters of the process are established through analyzing these effects.

关 键 词：超声波化学沉积 沉积速度 声强 自分解 

分 类 号：TQ153.2[化学工程—电化学工业]