LiNbO_3陶瓷溅射靶材的制备工艺研究  

On the Preparation Process of the LiNbO_3 Ceramic Target for Sputtering

作　　者：傅焰峰[1] 李佐宜[1] 卢德新[1] 林更琪 

机构地区：[1]华中理工大学固体电子学系

出　　处：《华中理工大学学报》1996年第5期76-78,共3页Journal of Huazhong University of Science and Technology

摘　　要：采用改进的陶瓷烧结工艺，研究了用于射频磁控溅射工艺的大尺寸薄型ＬｉＮｂＯ３陶瓷靶材的烧结工艺，解决了烧结过程中Ｌｉ２Ｏ的外逸造成成分偏差和Ｌｉ２Ｏ含量偏低时不易得到致密陶瓷的问题，探讨了Ｌｉ２Ｏ在烧结过程中的作用，制备出了高强度的ＬｉＮｂＯ３＋Ｌｉ２Ｏ系列陶瓷靶材．By using an improved ceramic sintering technique, the sintering process for the preparation of large-size thin LiNbO3 ceramic targets for r. f. magneto-sputtering is studied. The problem of the deviation of chemical composition due to the loss of Li2O during sintering and of how to obtain LiNbO3 ceramic of high density has been sooved. The role of Li2O during sintering is discussed. A series of LiNbO3+Li2O ceramic targets of high density for sputtering have been prepared.

关 键 词：铌酸锂 铁电陶瓷靶 烧结 微观结构 

分 类 号：TN204[电子电信—物理电子学]