相分离对SiO_2薄膜粗糙度的影响  

INFLUENCE OF PHASE SEPARATION ON SURFACE ROUGHNESS OF SiO_2 THIN FILM

作　　者：侯和峰[1] 田辉[1] 陈玉清[1] 

机构地区：[1]山东轻工业学院材料科学与工程学院,250100

出　　处：《陶瓷学报》2006年第3期291-295,共5页Journal of Ceramics

基　　金：山东省自然基金项目(编号:Y2005F28)

摘　　要：用氨水做催化剂配制碱溶胶,用盐酸做催化剂配制酸溶胶,在酸、碱混合溶胶中添加聚丙稀酸(PAA)引发相分离,通过添加不同含量的PAA,制备出具有不同粗糙度的透明薄膜,随后经过三甲基氯硅烷(TMCS)修饰,具有疏水性能和不同的疏水效果。Hydrophobic silica-based thin films were prepared by means of sol-gel process, phase separation and self-assembly （SA）. A thin film with desired surface roughness was obtained by mixture of HCI-catalyzed acid sol with NH4OH-catalyzed alkaline sol and phase separation of tetraethyl-orthosilicate （TEOS） induced by addition of polyacrylic acid （PAA）. After further modification by a self-assembled monolayer, the film＇s wetting properties changed and became hydrophobic. Films with different PAA content showed different hydrophobicity.

关 键 词：疏水 Sol—Gel方法 相分离 

分 类 号：TQ174.75[化学工程—陶瓷工业]