Photoluminescence Properties of Two-dimensional Planar Layer and Three-dimensional Island Layer for ZnO Films Grown Using MOCVD  

作　　者：HUANG Ke-ke HOU Chang-min GAO Zhong-min LI Xiang-shan FENG Shou-hua ZHANG Yuan-tao ZHU Hui-chao DU Guo-tong 

机构地区：[1]State Key Laboratory of Inorganic Synthesis and Preparative Chemistry [2]Department of Electronic Science and Engineering, Jilin University, Changchun 130012, P. R. China

出　　处：《Chemical Research in Chinese Universities》2006年第6期692-695,共4页高等学校化学研究（英文版）

基　　金：Supported by the National Natural Science Foundation of China(Nos. 20071013 and 20301007).

摘　　要：ZnO（002） films with different thicknesses ranging from 7 to 300 nm were grown on sapphire（006） substrates via metal-organic chemical vapor deposition （MOCVD）. The two-dimensional（2D） planar layer and the three-dimensional（3D） island layer were studied by using of X-ray diffraction（XRD） rocking curves and atomic force microscopy （AFM）. The room temperature photoluminescence （PL） spectra show a blue shift of the peak positions of the uhraviolet（UV） emission with increasing film thickness. The blue shift is remarkably high（393-380 nm） when an increase in film thickness（7-15 nm） is accompanied by the change of structure from a 2D planar layer to a 3D island layer. The PL spectra at 77 K also indicate that there are different transition mechanisms in the film thickness from a 2D planar layer to a 3D island layer near the 2D layer region.ZnO（002） films with different thicknesses ranging from 7 to 300 nm were grown on sapphire（006） substrates via metal-organic chemical vapor deposition （MOCVD）. The two-dimensional（2D） planar layer and the three-dimensional（3D） island layer were studied by using of X-ray diffraction（XRD） rocking curves and atomic force microscopy （AFM）. The room temperature photoluminescence （PL） spectra show a blue shift of the peak positions of the uhraviolet（UV） emission with increasing film thickness. The blue shift is remarkably high（393-380 nm） when an increase in film thickness（7-15 nm） is accompanied by the change of structure from a 2D planar layer to a 3D island layer. The PL spectra at 77 K also indicate that there are different transition mechanisms in the film thickness from a 2D planar layer to a 3D island layer near the 2D layer region.

关 键 词：ZnO films Metal-organic chemical vapor deposition（MOCVD） PHOTOLUMINESCENCE Planar layer Island layer 

分 类 号：TN304.23[电子电信—物理电子学]