磁控溅射法制备TiO_2薄膜的光催化特性  

THE ANALYSIS OF CATALYTIC PROPERTIES OF TiO_2 FILMS FABRICATED BY MF MAGNETRON SPUTTERING

作　　者：李海玲[1] 王文静[1] 亢国虎[2] 宋爽[2] 许颖[2] 

机构地区：[1]中科院电工研究所,北京100080 [2]北京市太阳能研究所,北京100083

出　　处：《太阳能学报》2006年第11期1103-1107,共5页Acta Energiae Solaris Sinica

摘　　要：采用中频磁控溅射法与弧抑制技术相结合制备出了廉价、大面积、光催化效果好并且膜与衬底结合牢固的TiO2薄膜。通过改变衬底材料、薄膜厚度、掺杂类型等参数,发现在不锈钢丝网衬底上制备的氮掺杂薄膜在500nm厚时具有最好的光催化效果。用此方法制备TiO2薄膜可以大面积连续生产,具有廉价、催化性能好,与衬底结合牢固、方便应用等优点,因而可以广泛的应用于空气净化器中,从而有利于TiO2光催化薄膜的产业化发展。TiO2 films with cheap price, large area, good catalytic property and good adhesion to substrates were fabricated by combining the median frequency magnetron sputtering technology and handling arcs technology. By changing the sputtering parameters such as the type of substrates, the thickness of films and the doped materials, it was found that N2 doped TiO2 film with stainless steel net as the substrate presented the best catalytic property when the thickness is 500nm. Using this method TiO2 films can be yield continuingly with good properties such as inexpensive price, good catalytic property for purifying air and others in commercial production. The fabricated TiO2 films can degrade the SO2 and cigarette mist very well was tested by the environmental health ＆sanitary engineering institute of Chinese academy of preventive medicine .

关 键 词：TIO2 光催化活性 磁控溅射 

分 类 号：O543[理学—物理]