磁流变抛光工艺参数的正交实验分析  

Orthogonal experiment and analysis on polishing parameters of MRF

作　　者：彭小强[1] 戴一帆[1] 李圣怡[1] 

机构地区：[1]国防科技大学机电工程与自动化学院,长沙410073

出　　处：《光学技术》2006年第6期886-888,892,共4页Optical Technique

基　　金：国家自然科学基金资助项目(50375156)

摘　　要：对利用自行配制的水基磁流变抛光液和磁流变抛光实验样机进行了以抛光去除效率和表面粗糙度为考核指标的工艺实验。应用正交试验方法分析了磁流变抛光中主要工艺参数(磁场强度、抛光粉浓度、抛光盘的转速、抛光盘与工件间的间隙)对抛光去除效率和表面粗糙度的影响规律,并结合磁流变抛光机理对其进行了分析。根据实验结果对工艺参数进行了优化。The orthogonal experiment of MRF optic work pieces is preceded on the MRF prototype machine tool using MR fluid. The influence to the removal efficiency and surface roughness by the processing parameters such as magnetic field intersity, the density of polishing abrasive, gap length between the work piece and the polishing wheel and polishing wheel rotation speed is discussed and analyzed according to MRF mechanism and optical glass removal mechanism. Synthesized with the fore parameters, the optimized technological parameter for MRF optical glass has been got. This research establishes foundation for MRF technology in optical machining field.

关 键 词：磁流变抛光 正交试验 抛光效率 表面粗糙度 

分 类 号：TH164[机械工程—机械制造及自动化]