光系统Ⅱ的抑制增强N基因介导的抗性但减弱烟草非寄主抗性  

Inhibition of photosystem Ⅱ enhances the N-mediated resistance but attenuates tobacco nonhost resistance

作　　者：何伟华[1] 蔡新忠[1] 张志新[1] 

机构地区：[1]浙江大学生物技术研究所,浙江杭州310029

出　　处：《浙江大学学报（农业与生命科学版）》2006年第6期628-632,共5页Journal of Zhejiang University:Agriculture and Life Sciences

基　　金：霍英东教育基金会第十届高等院校青年教师基金资助项目(101032)

摘　　要：以除草剂敌草隆为光合作用电子传递系统中光系统Ⅱ的抑制物,携带抗病基因/无毒基因互补基因对N/P50的杂交一代烟草为植物基因对基因抗病性研究材料,以及炭疽菌薏苡分离物及其非寄主植物烟草为非寄主抗病性研究系统,研究了光照通过光合作用途径对植物基因对基因抗病性和非寄主抗病性的影响.结果显示,23.3 mg?L-1敌草隆处理加速N/P50烟草苗中过敏性反应的产生.原本为烟草非病原的炭疽菌薏苡分离物成功侵染经23.3 mg?L-1敌草隆处理的非寄主植物的烟草,形成细小炭疽病病斑.但病斑扩大受到明显限制,不产生大量分生孢子.因此,光系统Ⅱ介导的途径减弱N介导的抗性,但增强烟草对炭疽菌薏苡分离物的非寄主抗性.这些结果表明,光系统Ⅱ介导的途径影响多种形式的抗病性,并且对不同形式抗病性的影响作用不同.Influence of light through photosynthesis-mediated pathway on plant gene-for-gene resistance and nonhost resistance was studied, employing the herbicide diuron as inhibitor of photosystem Ⅱ which is involved in electron transport during photosynthesis, the tobacco F1 progeny carrying the R/Avr complementary gene pair N/P50 as materials of study on plant gene-for-gene resistance, and Colletotrichum adlay isolate and its nonhost tobacco as interaction system of study on plant nonhost resistance. It was found that treatment with 23.3 mg·L^-1 diuron speeded up the N-mediated hypersensitive response in the N/P50 tobacco. The original tobacco nonpathogen Colletotrichum adlay isolate successfully infected 23.3 mg·L^-1 diuron-treated tobacco plants, resulting in lesions mimicking typical anthracnose disease symptom. However, expansion of the lesions was limited, and no significant amount of spores formed. Thus, the photosystem Ⅱ-mediated pathway attenuated the N-mediated resistance but enhanced tobacco nonhost resistance to Colletotrichum adlay isolate. These data demonstrate that the photosystem Ⅱ-mediated pathway influences a variety of types of plant disease resistance by a different way.

关 键 词：光照 光系统Ⅱ 敌草隆(diuron) N基因 基因对基因抗病性 非寄主抗病性 

分 类 号：S945.11[农业科学—水产养殖]