表面处理细化取向硅钢磁畴的方法与机理  

Methods and mechanism of the domain refinement of grain oriented silicon steel by surface treament

作　　者：朱业超[1] 王良芳[2] 乔学亮[1] 

机构地区：[1]华中科技大学材料科学与工程学院,湖北武汉430080 [2]武汉钢铁(集团)公司技术中心,湖北武汉430080

出　　处：《钢铁研究》2006年第6期50-53,共4页Research on Iron and Steel

摘　　要：磁畴细化技术是降低取向硅钢铁损重要的方法之一。本文概述了国内外表面处理使磁畴细化的方法,这些方法使磁畴细化的机理,以及细化磁畴可降低铁损的机理。Domain refinement technique is an important method on the iron loss decreasing of grain oriented silicon. In this paper, the domain refinement methods by surface treatment that are studied widely at home and abroad are summarized. The mechanism on how the domains are refined by these methods is discussed. It is also analyzed in this paper how the iron loss of grain oriented silicon is decreased by domain refinement.

关 键 词：取向硅钢 磁畴细化 刻痕 张应力 

分 类 号：TF325[冶金工程—冶金机械及自动化]