检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
机构地区:[1]西北工业大学电流变技术研究所,西安710072 [2]清华大学电机工程与应用电子技术系,北京100084
出 处:《物理学报》2006年第12期6441-6446,共6页Acta Physica Sinica
基 金:国家杰出青年科学基金(批准号:50025207);国家重点基础研究发展规划(批准号:2004CB719805);航空科学基金(批准号:05G53045)资助的课题.~~
摘 要:采用电路板刻蚀技术制备左手材料样品,由劈尖法分别研究了无缺陷和引入缺陷时左手材料的负折射特性.实验结果表明,引入两种点缺陷材料与无缺陷材料的功率峰值之比分别为1·035和1·256,且负折射率的绝对值分别增大了9·6%和19·6%;引入空位缺陷材料与无缺陷材料的功率峰值之比最大为1·973,最小为0·364,负折射率的绝对值最大增大了68·3%,最小增大了9·6%.缺陷的存在改变了左手材料周期性结构,形成新的电磁谐振条件,使其负折射率和功率峰值发生了变化,实现了对左手材料负折射率的调控.We have investigated the defect effect on negative refraction of the left-handed metamaterials (LHMs). The printed circuit boards with LHMs are fabricated using a shadow mask/etching technique. The negative refraction of wedge-shaped LHMs samples with and without defects is investigated respectively. The experimental result shows that when two kinds of point defects are introduced into the sample, the ratio of the maximum power of samples with point defects to that without defects are 1. 035 and 1.256, and the absolute value of the negative refraction index increases by 9.6% and 19.6%, respectively. When three kinds of vacant defects are introduced into the sample, the ratios of the maximum power of samples with vacant defects to that without defects have the highest value of 1,973 and the lowest value of 0.364, and the absolute values of the negative refraction index have increased by 68.33% and 9.6% accordingly. We think that the defect b^aks the periodic structure of the sample, resulting in a new condition of the electromagnetism resonance which leads to the changes of the negative refraction index and the maximum power. So we can regulate the negative refraction index of LHMs by adjusting the defects.
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.222