Bi底层对FePt薄膜的影响  

The effect of a Bi underlayer on FePt thin film

作　　者：冯春[1] 李宝河[1] 韩刚[1] 滕蛟[1] 姜勇[1] 刘泉林[1] 于广华[1] 

机构地区：[1]北京科技大学材料物理与化学系,北京100083

出　　处：《物理学报》2006年第12期6656-6660,共5页Acta Physica Sinica

基　　金：教育部博士点基金(批准号:2003008003);教育部科学技术研究重点项目(批准号:104023);教育部新世纪优秀人才支持计划(批准号:NCET-04-0104)资助的课题.~~

摘　　要：利用磁控溅射的方法,在玻璃基片上制备了以Bi为底层的FePt薄膜,经不同温度真空热处理得到L10-FePt薄膜.研究了Bi做底层对FePt薄膜的有序化温度及矫顽力Hc的影响.实验结果表明:以Bi做底层的FePt薄膜在350℃实现低温有序,同时其Hc也有大幅度提高,并且可以在更大成分范围内获得Hc较高的L10-FePt薄膜.利用X射线光电子能谱研究了薄膜中Bi原子的分布情况,利用X射线衍射研究了薄膜的晶体学结构变化.结果表明,Bi底层在退火过程中的扩散促进了FePt薄膜有序度的升高.In this paper, the FePt films with Bi underlayer were prepared by dc magnetron sputtering on glass substrates. The L10-FePt films were obtained after the deposited samples were subjected to vacuum annealing at various temperatures. The effect of a Bi underlayer on the ordering temperature and magnetic properties of FePt films was studied. Experimental results show that the FePt film can realize the low-temperature ordering at 350 ℃ after introduction of a Bi underlayer. Moreover, the Bi underlayer can also obviously enhance the coercivity Hc of the film and enlarge the concentration range of FePt films with high Hc. We studied the distribution of Bi atoms by X-ray photoelectron spectroscopy and the change of crystal structure of FePt films by X-ray diffraction. The Cause of the above observatious is associated with enhanced ordering degree of FePt films by the Bi diffusion during annealing process.

关 键 词：L10-FePt薄膜 有序化温度 底层 扩散 

分 类 号：O484.4[理学—固体物理]