Bi_(3.25)La_(0.75)Ti_3O_(12)薄膜的制备及性能研究  

Preparation and Properties of Bi_(3.25)La_(0.75)Ti_3O_(12) Thin Films

作　　者：杜凤娟[1] 张曰理[1] 刘毅[1] 阳生红[1] 

机构地区：[1]中山大学光电材料与技术国家重点实验室//物理科学与工程技术学院,广东广州510275

出　　处：《中山大学学报（自然科学版）》2006年第6期125-127,共3页Acta Scientiarum Naturalium Universitatis Sunyatseni

基　　金：国家自然科学基金资助项目(50372085);广东省科技计划资助项目(2004B60303001)

摘　　要：用化学溶液法在P-S i(100)衬底上制备出了一系列不同退火温度的B i3.25La0.75Ti3O12(BLT)铁电薄膜。通过X-射线衍射、扫描电镜及椭偏光谱测量研究,得到了一系列BLT薄膜结晶状况、表面形貌及光学常数谱。其结果显示:BLT薄膜表面均匀、致密,没有裂纹;随着退火温度的升高BLT薄膜晶化越来越好,当退火温度为690℃时,BLT基本完全晶化;非晶态的BLT薄膜折射率明显低于晶态BLT薄膜的折射率,随着BLT薄膜退火温度的增加,薄膜折射率n增大且其消光系数k也略有增加。BLT thin films were prepared on P-type Si(100) substrates by chemical solution deposition(CSD).Crystalline and morphological evaluation were examined by X ray diffraction(XRD) and scanning electron microscope(SEM).Their optical constants(refractive index,and absorption coefficient) were obtained by spectroscopic ellipsometry.The results indicate that the BLT films were specular,crack-free and crystalline after annealing over 550℃.The refractive index n of amorphous BLT films is less than that of crystalline BLT films.The refractive index n of the BLT thin films increase with rise of annealing temperature and the extinction coefficient k of the BLT thin films increase a little with rise of annealing temperature.

关 键 词：BLT 化学溶液法 光学常数 

分 类 号：O484[理学—固体物理]