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作 者:朱嘉琦[1] 韩杰才[1] 胡超权[2] 郑伟涛[2] 韩潇[1] 孟松鹤[1]
机构地区:[1]哈尔滨工业大学特种环境复合材料技术国防科技重点实验室,黑龙江哈尔滨150080 [2]吉林大学材料科学与工程学院,吉林长春130012
出 处:《红外与毫米波学报》2006年第6期451-454,共4页Journal of Infrared and Millimeter Waves
基 金:国家"十五"预研项目(41312040401);国家863计划新材料领域(2002AA305507)资助项目
摘 要:为了有效保护硫化锌等红外光学元件并提高其在工作波段的透过率,根据薄膜光学原理进行增透设计,从而获得膜系光学参数;采用射频磁控溅射技术制备非晶碳化锗薄膜,通过调整甲烷流速比调整薄膜的折射率,根据流速比和沉积时间控制膜厚,再用过滤阴极真空电弧技术制备非晶金刚石薄膜,分别改变衬底偏压和沉积时间控制薄膜的折射率和膜厚.利用光谱椭偏仪和台阶仪表征薄膜折射率和膜厚,通过小角X射线反射和X射线光电子谱测试非晶金刚石薄膜的密度和非晶碳化锗薄膜中的锗含量,使用纳米压痕仪和傅里叶红外透射谱仪确定薄膜的硬度和红外透过率.试验表明,非晶金刚石和非晶碳化锗薄膜的折射率分别与薄膜的密度和薄膜中的锗含量密切相关,非晶金刚石与非晶碳化锗复合膜系是硫化锌等红外光学元件性能优异的增透保护膜.The design of antireflection was taken by using the combined films of amorphous diamond (α-D) and amorphous hydrogenated germanium carbide (α-Ge1-xCx : H) according to the fundamental theories of the optical interference coatings. The α-Ge1-xCx :H films, of which refractive index was adjusted by changing the methane flow rate ratio and its thickness was determined by the flow rate ratio and deposition time, were deposited by radio-frequency sputtering technology. The α-D films, of which refractive index was regulated by changing the substrate bias and its thickness was controlled by changing deposition time, were deposited by the filtered cathodic vacuum arc technology. The refractive index and film thickness were respectively measured by spectroscopic ellipsometry and surface profiler. The density of a-D films was characterized by XRR and the Ge content was examined by XPS. The hardness and infrared transmittance of the films were respectively evaluated by nano-indenter and FTIR. It has been shown that the combined α-D and α-Ge1-xCx :H films, of which refractive index was respectively correlated with the density and the Ge content, can be used to fabricate excellent antireflective and protective coatings for ZnS optical elements.
分 类 号:TB39[一般工业技术—材料科学与工程]
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