PMMA改性聚合物薄膜的光学性能研究  

Optical Properties of Modified PMMA Polymer Films

作　　者：周建华[1] 游佰强[1] 肖磊[1] 王静[2] 王晨[1] 

机构地区：[1]厦门大学电子工程系,福建厦门361005 [2]厦门大学材料科学与工程系,福建厦门361005

出　　处：《激光与光电子学进展》2006年第12期48-52,共5页Laser & Optoelectronics Progress

基　　金：高校骨干教师项目资金;福建省青年科技人才创新项目资助(2001J024)

摘　　要：利用两种聚合物合成改性手段制备了纳米颗粒SiO2掺杂PMMA溶胶,并采用旋涂法甩膜制得PMMA改性聚合物薄膜。通过分析薄膜样品在红外和可见光波长范围内的光损耗特性,优化了制备工艺,使其在提高热稳定性的同时能保证优良的光学性能。另外,还测试分析了改性PMMA薄膜在不同紫外光照条件下折射率和厚度的变化,从宏观现象与微观结构之间的关系及作用机理的角度进行了深入的理论分析。PMMA sol sophisticated with nano-silicon dioxide, by two kinds of compound modification processes, was used to fabricate modified polymer films under different spinning conditions. The fabrication technique was optimized according to the analysis results of their optical loss in infrared and visible light wavelength ranges. The sample shows excellent optical properties and thermal stability. In addition, the changes of refractive index and thickness under ultraviolet illumination with different conditions were studied in detail. Deep analysis was done on the relationship between macroscopical phenomena and microstructures.

关 键 词：导波光学 聚合物 光损耗 纳米改性 

分 类 号：TN25[电子电信—物理电子学] O631.24[理学—高分子化学]