CO_2激光-化学腐蚀制作金阵列微电极  

Fabrication of Gold Electrode Array Based on CO_2 Laser Ablation

作　　者：张维[1] 肖江群 周勇亮[1] 

机构地区：[1]厦门大学化学化工学院化学系化学生物学福建省重点实验室,福建厦门361005

出　　处：《电化学》2006年第4期429-433,共5页Journal of Electrochemistry

基　　金：福建省科技攻关重点项目(2004H86)资助

摘　　要：微电极的制作是微流控芯片电化学检测的关键技术.本文提出CO2激光烧蚀结合化学腐蚀快速制作微流控芯片阵列微电极的方法.在溅射Au/Cr的玻璃基片上涂敷指甲油作牺牲层,利用CO2激光烧蚀开窗口,经化学腐蚀后获得阵列电极,电极宽度为100μm.考察了激光加工参数及牺牲层对电极加工质量的影响,对由键合包封制作的微流控芯片,循环伏安及流动注射分析测试表明,该电极芯片可用于微流控芯片的安培检测.A rapid process is described to produce single or multiple electrodes of any shape based on CO2 laser ablation for microfluidic chip. The method is as follow： coating a kind of material as sacrifice layer on a piece of glass with sputtered Cr and Au; designing the needed pattern on a computer; selecting proper parameters and ablating with CO2 laser ; wiping of Au/Cr and sacrifice layer, and obtain electrodes at last. The microfluidic chip was gotten by reversely bonding with a piece of PDMS, and sealing around with PDMS prepolymer. The mask effect is the main factor that influencing electrode quality. The width of electrodes could be 100 μm. Demonstrated by voltammetry and flow injection amperometric analysis, the microfluidic chip could be used for amperometfic detection.

关 键 词：微流控芯片 金电极 CO2激光 

分 类 号：O657.1[理学—分析化学] TN4[理学—化学]