微波渗硼层中FeB的形成机理研究  

Mechanism of Formation of FeB During Microwave Boron Permeation

作　　者：章桥新[1] 张建红[2] 王玉伏[2] 胡正前[2] 

机构地区：[1]武汉理工大学材料复合新技术国家重点实验室,湖北武汉430070 [2]武汉理工大学机械电子工程学院,湖北武汉430070

出　　处：《材料保护》2006年第12期1-2,共2页Materials Protection

基　　金：国家自然科学基金资助(50371064);湖北省自然科学基金资助(2003ABA032)

摘　　要：通过微波处理、X射线衍射和扫描电镜等手段研究了微波场下渗硼层中FeB的形成机理,并与常规渗硼层进行了比较。结果表明,FeB向渗层内部采取(002)晶向取向生长,渗层表面无取向特征,且微波渗硼FeB相的生长不受表面硼化物晶核密度控制。An X-ray diffractometer and scanning electron microscope were performed to comparatively investigate the mechanisms of formation of conventional and microwave boron permeation layers, and the growth features of FeB in the boron permeation layers were highlighted. It was found that FeB preferentially grew towards the inner-layer and along (002) direction during the microwave boron permeation, and such a preferential growth was not observed on the surface of the permeated layer. At the same time, the formation of FeB during microwave boron permeation was independent of the density of surface boride as the crystallization nuclei.

关 键 词：微波渗硼 FEB 生长机理 

分 类 号：TG174.445[金属学及工艺—金属表面处理]