Cr-Si-Ni电阻薄膜在模拟环境中的电学稳定性及腐蚀行为  

Electrical properties stability and corrosion behavior of Cr-Si-Ni resistive films in simulated environments

作　　者：张玉勤[1] 蒋业华[2] 周荣[2] 

机构地区：[1]昆明理工大学云南省新材料制备与加工重点实验室,云南昆明650093 [2]昆明理工大学机电工程学院,云南昆明650093

出　　处：《功能材料》2006年第12期1891-1894,共4页Journal of Functional Materials

基　　金：云南省省院省校科技合作计划资助项目(2005YX11)

摘　　要：研究了磁控溅射法制备的Cr-Si-Ni电阻薄膜在不同模拟环境介质溶液中的电学稳定性及腐蚀行为。结果表明,500℃热处理后纳米晶结构的Cr-Si-Ni电阻薄膜在25℃的模拟海洋、工业、酸性及碱性环境介质溶液中浸泡240h后,薄膜试样的相对电阻变化值(ΔR/R)分别为0.27%、0.08%、0.96%、3.31%。说明薄膜在上述4种环境中电学稳定性和耐腐蚀性能从高到低依次为:工业环境、海洋环境、酸性环境、碱性环境。薄膜在4种溶液中都能发生自钝化现象而在膜层表面形成SiO2保护层,形成的钝化膜在模拟的工业环境中最稳定。Electrical properties stability and corrosion behavior of Cr-Si-Ni resistive films deposited by magnetron sputtering were investigated in different environments solutions. The results revealed that the relative resistance change （△R/R） of the nanocrystalline Cr-Si-Ni films by annealing at 500℃ in simulated marine, industrial, acidic, and alkaline environments at 25℃ for 240h were 0.27% ,0.08% ,0.96% ,3.31% ,respectively. It indicated that the electrical properties stability and corrosion resistance of the films decreased as industrial, marine ,acidic and alkaline environments in sequence. The films presented a spontaneous trend to passivation, and formed a SiO2 protective layer in all of the corrosion solutions. Furthermore, the passive film in industrial environment exhibited the best protective effects on the films than in other environments.

关 键 词：电阻薄膜 模拟环境 电学稳定性 腐蚀行为 

分 类 号：TM241.1[一般工业技术—材料科学与工程] TG172[电气工程—电工理论与新技术]