基体拉伸法测试二氧化钛薄膜界面结合强度  

Evaluating the bonding strength between TiO_2 and Ti through substrate stretched test

作　　者：杨金霞[1] 崔振铎[1] 魏强[1] 杨贤金[1] 

机构地区：[1]天津大学材料学院,天津300072

出　　处：《功能材料》2006年第12期1923-1925,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50471048)

摘　　要：利用热氧化法在工业纯钛表面形成氧化层,利用改进后的基体拉伸法研究了500和800℃加热1h所形成的氧化层和基体的结合强度,结果发现裂纹形貌与界面结合强度有关。500℃所形成的氧化层较薄,与基体的结合强度高,>970MPa,裂纹方向与载荷轴向呈±45°;而800℃形成的氧化层较厚,与基体的结合强度差,<495MPa,裂纹基本与载荷轴向垂直。The interface shear strength between TiOx and Ti was evaluated in this study using a substrate straining method. Specimens for the tensile test were thermal oxidized in an air furnace at 500 and 800℃ for an hour , After tensile loading, it was found that the fracture morphology of the TiOx film depended upon the bonding strength of the interfaces. A stronger bonding strength , at least 970MPa, of the TiO./Ti system heat treated at 500℃ was detected, and the most of the cracks in the TiOx films were aligned at a direction of ±45° to the tensile axis. Cracks in the film of TiO/Ti system heat treated at 800℃ showed periodicity and were perpendicular to the tensile axis and the bonding strength of the system was calculated to be at most 495MPa.

关 键 词：热氧化 氧化钛 界面结合力 基体拉伸法 

分 类 号：TB174.444[生物学—生物工程]