硅片表面球形粒子散射及微分散射截面的研究  

Calculation and analysis of light scattering and differential scattering cross section from a spherical particle on silicon wafer

作　　者：崔品静[1] 程兆谷[1] 

机构地区：[1]中国科学院上海光学精密机械研究所

出　　处：《激光技术》2006年第6期561-563,580,共4页Laser Technology

基　　金：上海市光科技专项行动计划"硅片缺陷自动检测仪研制"资助项目(036105026)

摘　　要：为了研究硅片表面球形粒子的光散射情况,根据M ie氏理论,采用相差模型,得到了球形粒子在任意线偏振光照射下的散射光光强空间分布的计算方法,给出了球形粒子在s偏振和p偏振光分别以0°和70°角照射下散射光微分散射截面的模拟计算结果,并与相关的实验结果进行了比较,对硅片缺陷自动检测仪的研制具有指导意义。Based on Mie theory, the phase difference model for calculating and analyzing the spatial distribution of scattering intensity from a spherical particle on a smooth surface radiated by a linearly polarized light beam is obtained. The differential scattering cross section is calculated when the s and p polarized light irritates the particles at 0° and 70° respectively. The calculation resuhs are compared with experimental results.

关 键 词：散射 光强空间分布 米氏理论 相差模型 微分散射截面 

分 类 号：O436.2[机械工程—光学工程]