光聚物材料中布喇格偏移的动态分析  

Analysis of Dynamic Behavior of Bragg Mismatch in Photopolymer

作　　者：翟凤潇[1] 李若平[1] 殷琼[1] 孙彩霞[1] 路海[1] 黄明举[1] 

机构地区：[1]河南大学物理与信息光电子学院光子与光电子技术研究所,河南开封475001

出　　处：《光子学报》2006年第12期1842-1845,共4页Acta Photonica Sinica

基　　金：河南省青年骨干教师基金;河南大学自然科学基金(XK02158);上海市基础研究重点项目(03JC140730)资助

摘　　要：对光致聚合全息存储材料光化学反应过程和引起布喇格偏移的因素进行了分析,通过理论推导,得到了曝光时间与布喇格偏移量的关系·实验曲线表明,材料的布喇格偏移先是随着曝光量的增加而增加,最后达到饱和值·实验的结果与理论分析进行比较,两者符合较好,说明对于布喇格偏移随时间变化动态过程的分析比较合理·Photo-induced reaction processes and factor of Bragg mismatch in the photopolymer for holographic storage were studied. On the basic of analysis of the theory, the relationship of Bragg mismatch and exposure time was deuced. The curve of the experiment indicated that the Bragg mismatch increased with the increasing of exposure time firstly, then reached saturation. The experimental results compared with analysis of the theory and they are fitted well. All those show that the analysis of the Bragg mismatch is reasonable.

关 键 词：布喇格偏移 光致聚合物 缩皱 全息存储 

分 类 号：O438.1[机械工程—光学工程]