蒸发器芯层内气液界面的波动原因  

The Reasons Which Lead the Interface to Wave for Vapor-Liquid Interface in Evaporator

作　　者：闫茂龙[1] 舒水明[1] 

机构地区：[1]华中科技大学能源与动力工程学院,武汉430074

出　　处：《能源技术》2006年第6期249-251,294,共4页Energy Technology

摘　　要：毛细抽吸两相回路(CPL)在正常稳态工作时,其蒸发器主要以芯层表面蒸发的方式传热。在此基础上,给出了多孔芯传热的三层模型,并提出等厚气膜薄层模型,分析了气液界面的形状及引起气液界面波动的原因。通过分析得出,蒸气在薄层内的流动阻力主要由芯层本身的特性来决定,而蒸气薄层厚度的精确值对其影响并不大。When capillary pumped loop works at well-balanced and steady state, the evaporator works by skin -evaporating in its porous media. Based on this viewpoint, this paper gives tri-layer heat transfer model in porous media and equal- thick vapor film lamella model, analyzes the figure of vapor- liquid interface and the reasons which lead the interface to wave. Through the analysis, it suggests that, the flow resistance of vapor in vapor lamella is determined by characteristics of porous media, the accurate value of vapor lamella＇s thickness is not much influencing.

关 键 词：CPL 蒸发器 芯层 表面蒸发 

分 类 号：TK124[动力工程及工程热物理—工程热物理]