Surface Roughness of Various Diamond-Like Carbon Films  

作　　者：刘东平 刘艳红 陈宝祥 

机构地区：[1]School of Mathematics and Physics,Dalian Nationalities University,Dalian 116600,China [2]State Key Laboratory for Material Modification by Laser,Ion and Electron Beams,Dalian University of Technology,Dalian 116024,China

出　　处：《Plasma Science and Technology》2006年第6期701-707,共7页等离子体科学和技术（英文版）

基　　金：supported by National Natural Science Foundation of China(No.10405005)

摘　　要：Atomic force microscopy is used to estimate and compare the surface morphology of hydrogenated and hydrogen-free diamond-like carbon （DLC） films. The films were prepared by using DC magnetron sputtering of a graphite target, pulsed cathodic carbon arcs, electron cyclotron resonance （ECR）, plasma source ion implantation and dielectric barrier discharge （DBD）. The difference in the surface structure is presented for each method of deposition. The influences of various discharge parameters on the film surface properties are discussed based upon the experimental results. The coalescence process via the diffusion of adsorbed carbon species is responsible for the formation of hydrogen-free DLC films with rough surfaces. The films with surface roughness at an atomic level can be deposited by energetic ion impacts in a highly ionized carbon plasma. The hydrocarbon species dangling bonds created by atomic hydrogen lead to the uniform growth of at the a-C：H film surfaces of the ECR or DBD plasmasAtomic force microscopy is used to estimate and compare the surface morphology of hydrogenated and hydrogen-free diamond-like carbon （DLC） films. The films were prepared by using DC magnetron sputtering of a graphite target, pulsed cathodic carbon arcs, electron cyclotron resonance （ECR）, plasma source ion implantation and dielectric barrier discharge （DBD）. The difference in the surface structure is presented for each method of deposition. The influences of various discharge parameters on the film surface properties are discussed based upon the experimental results. The coalescence process via the diffusion of adsorbed carbon species is responsible for the formation of hydrogen-free DLC films with rough surfaces. The films with surface roughness at an atomic level can be deposited by energetic ion impacts in a highly ionized carbon plasma. The hydrocarbon species dangling bonds created by atomic hydrogen lead to the uniform growth of at the a-C：H film surfaces of the ECR or DBD plasmas

关 键 词：atomic force microscopy diamond-like carbon surface roughness 

分 类 号：O484[理学—固体物理]