CSTN-LCD用铬版清洗效果的改善  

Improvement of Cr-mask Cleaning

作　　者：张金龙[1] 荆海[1] 马凯[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所北方液晶工程研究开发中心,吉林长春130031

出　　处：《液晶与显示》2006年第6期692-695,共4页Chinese Journal of Liquid Crystals and Displays

基　　金：国家自然科学基金资助项目(No.60576056)

摘　　要：利用铬版清洗机对CSTN-LCD用铬版进行清洗处理,分析了清洗过程中出现的铬层脱落现象,铬层脱落与轴向喷射压力和水平切力密切相关,通过调整转速和喷射压力探索了安全使用条件:在转速不超过1000r/min,喷射压力低于0.5×105Pa的情况下使用铬版清洗机进行清洗是相对安全的。同时采用预清洗处理的方法满足清洁要求,使换线时间由平均3h缩短到平均1h以内,年产能提高270000片。Cr-mask of CSTN-LCD was cleaned by mask-cleaning machine. The cause of scraping of Cr-layer broke off from Cr-mask in cleaning was analyzed. It depends heavily on axial spray press and horizontal circumferential force. With adjusting rev and spray press, it was found out that the secure conditions of manipulating mask-cleaning machine were the rev not more than 1 000 r/min and the spray press less than 0.5×10^5 Pa. It is necessary to fulfil requirement of clean by the means of pre-cleaning. The average conversion time was shorten from 3 h to 1 h. The throughput was increased by 270 000 sheets.

关 键 词：CSTN-LCD 铬版清洗 铬层脱落 预清洗 换线时间 

分 类 号：TN141.9[电子电信—物理电子学]