高纯钯中痕量杂质的电感耦合等离子体质谱测定方法研究  

Study on the Determination of Trace Impurities in High Purity Palladium by Inductively Couple Plasma-Mass Spectrometry

作　　者：刘湘生[1] 张安定[1] 潘元海[1] 刘玉龙[1] 

机构地区：[1]北京有色金属研究总院,北京100088

出　　处：《现代科学仪器》2006年第6期66-68,共3页Modern Scientific Instruments

摘　　要：建立了高纯钯中16种痕量杂质的电感耦合等离子体质谱测定方法。考察了基体Pd的谱干扰和基体效应,采用Sc、Cs双内标补偿基体对待测信号的抑制。方法检出限为0.002μg/L～0.04μg/L,加标回收率为86%～114%,分析精密度为0.6%～3.9%。方法简便、快速、灵敏、准确。The method of inductively coupled plasma-mass spectronmetry for the determination of impurities of 16 trace elements in highly pure palladium was studied. The spectral interference＇and matrix effect for palladinm on the method were discussed. The matrix suppression effect of palladinm on signal could.effectively be eliminated by using Sc, Cs as internal standard. The determination limit is 0.002μg/L-0.04μg/L, the recovery rate of standand addition is 86 %-114 %, preision is 0.6 %-3.9 %. This method is simvle, ravid, sensitive and accurate.

关 键 词：电感耦合等离子体质谱法 高纯钯 痕量杂质 内标 

分 类 号：O657.63[理学—分析化学] TG115.3[理学—化学]