脉冲激光沉积有机薄膜  

Pulsed Laser Deposition of Organic Thin Films

作　　者：王卫[1] 李承祥[1] 盛六四[1] 张国斌[1] 王淑芬[2] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230027 [2]山东理工大学数学与信息科学学院,淄博255049

出　　处：《材料导报》2007年第1期46-52,共7页Materials Reports

基　　金：国家自然科学基金(10575099)

摘　　要：脉冲激光沉积(PLD)技术是一门新兴的薄膜制备技术,在无机薄膜的制备和研究方面取得了令人满意的成果,技术也比较成熟。但利用脉冲激光沉积技术制备和研究有机膜方面的工作开展较晚,工作也比较少,尚未形成一个比较系统的体系。因此开展有机薄膜的脉冲激光沉积研究将具有重要的意义。Pulsed laser deposition （PLD） is a newly-rising technology for the deposition of thin films. Many satisfying findings have been achieved in the deposition and research of inorganic thin films. And the technology is sophisticated. However, it is only lately that the pulsed laser deposition and research of organic thin films began to develop. Little research has been done in this domain no systematic system is established. So the research on the pulsed laser deposition of organic thin films will be significant.

关 键 词：脉冲激光沉积 有机薄膜 有机杂化膜 复合薄膜 

分 类 号：TN304[电子电信—物理电子学]