脉冲激光沉积法制备β-BBO薄膜  

Growth of β-BBO Thin Films by Pulsed Laser Deposition

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作  者:刘军芳[1] 徐军[2] 姚武[1] 

机构地区:[1]同济大学材料科学与工程学院,上海200092 [2]中国科学院上海光学精密机械研究所,上海201800

出  处:《材料导报》2007年第1期140-142,共3页Materials Reports

摘  要:采用脉冲激光沉积法、选取β-BBO陶瓷作为靶材在掺Sr2+的α-BBO(001)衬底上进行了生长β-BBO薄膜的实验,生长出表面光滑、无色透明的薄膜。采用X射线粉末衍射(XRD)、高分辨X射线衍射仪(XRC)对薄膜进行了分析测试,结果表明,所制备的β-BBO薄膜择优取向为(00l)面,薄膜的双晶摇摆曲线半峰宽值FWHM为1000″左右,显示出β-BBO薄膜较好的结晶质量,其紫外吸收边同β-BBO单晶一样也为190nm,但薄膜的透过率略有下降。采用调Q脉冲Nd∶YAG激光器观察了β-BBO薄膜的倍频效应。β-BBO films which are clear and smooth are grown by pulsed laser deposition on Sr^2+ Ldoped α-BBO substrates using β-BBO ceramics as target. The β-BBO thin films are investigated by means of XRD, XRC and spectrometer. The XRD results show that the grown films are (001)-oriented. The full width at half-maxlmum of the rocking curve for the film is as low as about 1000", which shows the high crystallinity of thin films. The absorption edge of the film on a Sr^2+-doped α-BBO substrate is 190 nm, which is similar to that of β-BBO crystal. Meanwhile, the second harmonic generation properties of β-BBO films are observed by Q-switched Nd : YAG laser.

关 键 词:脉冲激光沉积 β-BBO薄膜 Sr^2+ α-BBO衬底 

分 类 号:TN713.1[电子电信—电路与系统]

 

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