Fabrication of grating waveguide using photopolymerization  

Fabrication of grating waveguide using photopolymerization

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作  者:姚书山 秦晓燕 于晓强 张奇 许光辉 王泽岩 董毅 荆象阳 孙渝明 黄柏标 

机构地区:[1]State Key Laboratory of Crystal Materials,Shandong University,Ji’nan 250100,China [2]Department of Optics,Shandong University,Ji’nan 250100,China

出  处:《中国有色金属学会会刊:英文版》2006年第B01期88-91,共4页Transactions of Nonferrous Metals Society of China

基  金:Project (2004CB719803) supported by the National Basic Research Program; Project(60377041) supported by the National Natural Science Foundation of China

摘  要:Two ternary materials systems, which comprise photoinitiator/two-photon initiators, oligomer and binder were prepared. Polymeric waveguide film was manufactured by spinning the materials on optical glass (refraction index=1.5), the two-photon initiated photopolymerization (TPIP) and single-photon holographic photopolymerization were carried out respectively in the polymer waveguide film. The preparation of these materials was explained and absorption spectra were tested. The experimental results including the micrographs and diffraction patterns verifying the formation of grating waveguide structures were given. The results show that grating waveguide microstructures can be holographically fabricated by single-photon photopolymerization with low-power (tens mW ) continuous-wave (CW) laser at 532 nm successfully. Because the continuous-wave laser at 532 nm is handier than one at 514 nm.Two ternary materials systems, which comprise photoinitiator/two-photon initiators, oligomer and binder were prepared. Polymeric waveguide film was manufactured by spinning the materials on optical glass (refraction index=1.5), the two-photon initiated photopolymerization (TPIP) and single-photon holographic photopolymerization were carried out respectively in the polymer wavbguide film. The preparation of these materials was explained and absorption spectra were tested. The experimental results including the micrographs and diffraction patterns verifying the formation of grating waveguide structures were given. The results show that grating waveguide microstructures can be holographically fabricated by single-photon photopolymerization with low-power (tens mW ) continuous-wave (CW) laser at 532 nm successfully. Because the continuous-wave laser at 532 nm is handier than one at 514 nm.

关 键 词:光化聚合作用 光栅 波导 制造 光学性质 

分 类 号:TB332[一般工业技术—材料科学与工程]

 

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