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作 者:单英春[1] 赫晓东[2] 徐久军[1] 李明伟[2]
机构地区:[1]大连海事大学机电与材料工程学院,辽宁大连116026 [2]哈尔滨工业大学复合材料与结构研究所,黑龙江哈尔滨150080
出 处:《功能材料》2007年第2期249-251,255,共4页Journal of Functional Materials
基 金:国家高技术研究发展计划(863计划)资助项目(2002AA763020);新世纪优秀人才支持计划资助项目(NCET2004)
摘 要:采用动态蒙特卡罗(KMC)方法模拟电子束物理气相沉积(EB-PVD)制备Ni-Cr合金薄膜过程中沉积速率与薄膜微观结构之间的关系,并用分维理论研究薄膜表面形貌。研究结果表明:对于基板温度为500K,入射角度为35°的情况,沉积速率<5μm/min时,薄膜表面分维均<2.04,表面光滑,而当沉积速率>5μm/min时薄膜分维随沉积速率增大而增大,表面变得越来越粗糙,直到沉积速率升高到1000μm/min时,分维达到最大值2.31,表面非常粗糙,具有细致的皱褶和缺陷。分维与沉积速率间的关系说明低沉积速率有利于分维小、表面光滑薄膜的制备,而高沉积速率使薄膜分维增大、表面结构更加复杂。该研究结果与沉积速率对EB-PVD薄膜表面粗糙度影响的研究结果一致,表明分维也是评价薄膜表面形貌的途径。Kinetic Monte Carlo simulation has been applied to approach the relationship between deposition rate and microstructure of Ni-Cr thin film deposited by electron beam physical vapor deposition, and fractal theory is used to characterize thin film surface topography. The results reveal that the fractal of Ni-Cr alloy thin film is less than 2.04 and thin film surface is smooth when deposition rate is less than 5μm/min for substrate tempera- ture of 500K and incident angle of 35°, but the fractal increases and surface becomes more and more roughness with deposition rate increasing when deposition rate is more than 5μm/min until deposition rate reach 1000μm/ min. The fractal of thin film is not less than 2.31 and there are fine rugosity and defect in film surface when deposition rate is more than 1000μm/min. The relationship of Ni-Cr alloy thin film fractal and deposition rate indicates that low deposition rate contribute to the preparation of film with small fractal and smooth surface, but thin films with large fractal and complex surface are obtained when deposition rate is high. The study results are accord with the results of thin film surface roughness factor dependent on deposition rate, which reveals that the fractal is a way to evaluate thin film surface topography.
关 键 词:分维 沉积速率 Ni—Cr合金薄膜 EB-PVD KMC
分 类 号:TG14[一般工业技术—材料科学与工程]
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