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出 处:《西安交通大学学报》1996年第6期115-122,共8页Journal of Xi'an Jiaotong University
摘 要:报导了在P/I界面引入CGL:B:C*缓冲层对大面积(2790cm2)单结集成P-I-N型。a-SI:H太阳电池性能影响的研究结果.实验发现:带有CGL:B:C层的a-SI:H太阳电池性能的提高主要是填充因子FF的增加所导致,实验所得电池的FF平均达60.33%,平均有效面积转换效率FF达6.0%,分别比目前的生产水平(FF=53.9%,EF=53%)提高了11.99%和13.2%.最后,依据建立的电池能带模型,从理论上解释了引入CGL:B:C后电池性能得以提高的原因.This paper reports some investigation results of large area (2 790 cm2)single junction integrated a-Si:H solar cell with boron and carbon composition graded layer (CGL:B:C) at P/I heterointerface.It is found that the performance of a-Si:H solar cell with CGL:B:C is improved, which is mainly caused by the increase of fill factor.The mean fill factor and effective photoelectric conversion effeciency of experimental solar cell are 60.33% and 6. 0%respectively,increasing by 11.9% and 13.2% relative to the present production efficiencies (FF=53.9%, EF=5.3% ).Finally, energy band model of a-Si:H solar cells with buffer layer is established to explain theoretically the cause of enhanced performance.
分 类 号:TM914.42[电气工程—电力电子与电力传动]
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