Enhancement of Gongronella sp.JG Chitosanase Production by Ion Beam Implantation  

作　　者：袁航 周伟 王军 张束清 姚建铭 

机构地区：[1]Key Laboratory of Ion Beam Bioengineering,Chinese Academy of Sciences,Hefei 230031,China

出　　处：《Plasma Science and Technology》2007年第1期115-118,共4页等离子体科学和技术（英文版）

基　　金：the National Natural Science Foundation of China(No.10605027).

摘　　要：Gongronella sp. JG was a fungal strain which expressed extracellular chitosanase of about 800 U/L during its growth in production medium. To improve its enzyme production, low energy N＋ implantation was employed to mutate spores of JG. The implantation condition was optimized and the parameters of 15 keV and 60 × breeding experiments. A mutant designated as SG 2.6 × 10^13 ions/cm^2 were selected for further was obtained. It showed increased chitosanase production （1800 U/L） and shortened cultivation period （from 72 h to 60 h）. Five-generation cultivation of SG indicated that its chitosanase production was stable at about 1800 U/L.Gongronella sp. JG was a fungal strain which expressed extracellular chitosanase of about 800 U/L during its growth in production medium. To improve its enzyme production, low energy N＋ implantation was employed to mutate spores of JG. The implantation condition was optimized and the parameters of 15 keV and 60 × breeding experiments. A mutant designated as SG 2.6 × 10^13 ions/cm^2 were selected for further was obtained. It showed increased chitosanase production （1800 U/L） and shortened cultivation period （from 72 h to 60 h）. Five-generation cultivation of SG indicated that its chitosanase production was stable at about 1800 U/L.

关 键 词：BREEDING CHITOSANASE Gongronella sp. ion beam implantation 

分 类 号：Q55[生物学—生物化学]