一种新型酞菁类光蚀刻记录材料的光生酸性质研究  

Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials

作　　者：黄蕾[1] 宾月景[1] 黄新[1] 张复实[1] 

机构地区：[1]清华大学化学系有机光电子与分子工程教育部重点实验室,北京100084

出　　处：《感光科学与光化学》2007年第2期142-146,共5页Photographic Science and Photochemistry

基　　金：国家自然科学基金(20333080;20572059;20502013);国家基础研究项目(2007CB808000)

摘　　要：通过研究对甲苯磺酸酯空心酞菁的性质,发现该化合物在紫外光照射下可生酸,是一种光生酸剂.由于酞菁类化合物本身具有光催化氧化反应的性能,因此这类光生酸剂在光蚀刻技术中将有很好的应用潜能.A New Phthalocyanine derivative, the p-toluenesulfonylphthalocyanine was synthesized from metal-free phthalocyanine. The photolysis properties of the compound exposed with UV light was investigated. It was found that the p-toluenesulfonylphthalocyanine can generate acid after exposure. With good photocatalysis property, this photoacid-generator is applicable to chemically amplified photoresist.

关 键 词：化学增幅抗蚀剂 光生酸剂 光催化 酞菁 

分 类 号：TQ571[化学工程—精细化工]