FeCl_3–HCl体系紫铜化学抛光工艺的探讨  

Chemical polishing technology of copper in a solution based on FeCl_3 and HCl

作　　者：张忠诚[1] 井涛[1] 付莹莹[1] 熊丽君[1] 

机构地区：[1]山东大学化学与化工学院,山东济南250061

出　　处：《电镀与涂饰》2007年第3期9-13,共5页Electroplating & Finishing

摘　　要：研究了紫铜在FeCl3–HCl微酸性体系中化学抛光的工艺。介绍了该化学抛光工艺的流程及各前、后处理工序的配方。通过筛选实验,确定抛光液中光亮剂为脂肪醇聚氧乙烯醚(AEO-9),辅助光亮剂为乙醇,缓蚀剂为苯并三氮唑(BTA)。采用正交试验,得到最佳化学抛光液配方为:每100mL抛光液中含8g FeCl3,8mL盐酸,0.1 mLAEO-9,0.2g BTA,1.2mL乙醇。最佳抛光温度为30°C左右。根据正交试验结果,讨论了抛光液组成及温度对抛光效果的影响。各因素对抛光效果的影响作用由大到小依次为:抛光液温度>FeCl3质量浓度>AEO-9体积分数或BTA质量浓度>乙醇体积分数>盐酸体积分数。该工艺操作简单,抛光速度快,效果好,低污染,易于推广。A process for chemical polishing of red copper in a weakly acid FeCl3-HCl bath was studied. The polishing process flow and the formulations ofpre- and post-treatments were introduced. A polishing bath with AEO-9 （aliphatic alcohol polyethylene oxide ether） as brightener, ethanol as auxiliary brightener and benzotriazole （BTA） as inhibitor was determined through screening experiment. Based on orthogonal experiment, an optimal formulation of polishing bath was obtained. The bath （100 mL） contains 8 g FeCl3, 8 mL HCl, 0.1 mL AEO-9, 0.2 g BTA and 1.2 mL ethanol. The optimal polishing temperature is about 30℃. Factors affecting polishing quality, such as bath composition and temperature, were discussed. The effects of various factors on brightness are in the following descending order： polishing temperature 〉 mass concentration ofFeCl3 〉 volume fraction of AEO-9 or mass concentration ofBTA 〉 volume fraction of ethanol 〉 volume fraction of HCl. The process is easy to popularize due to its advantages of simple operation, high speed, good brightness and low contamination,

关 键 词：紫铜 化学抛光工艺 光亮剂 缓蚀剂 正交试验 FECL3 AEO-9 BTA 

分 类 号：TQ423.2[化学工程]