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作 者:羊恺[1] 刘娟秀[1] 刘霖[2] 叶玉堂[2] 补世荣[1] 罗正祥[1]
机构地区:[1]电子科技大学电子工程学院微波中心,四川成都610054 [2]电子科技大学光电信息学院,四川成都610054
出 处:《光电工程》2007年第3期132-135,共4页Opto-Electronic Engineering
基 金:国家自然科学基金(60277008);国家863项目基金(2002AA306421);电子科大校青年基金(JX05010)资助项目
摘 要:利用自行研制的电流与红外实时监测系统,研究了YBCO高温超导薄膜激光辅助化学刻蚀进程中溶液腐蚀电流与红外辐射的变化规律,为YBCO激光化学刻蚀技术中激光功率选择,腐蚀液配比,温度控制以及刻蚀时间的掌握提供了重要的实验依据。主要研究结论包括:YBCO薄膜激光化学刻蚀中溶液腐蚀电流初始值较大,增长速率相对稳定,观察到“陡降峰”的出现,并与无激光辐照下的溶液腐蚀电流变化曲线进行对比,分析了可能的原因;通过对腐蚀溶液的侧面红外实时监测,观察化学热的生成及其对流情况,发现激光辐照使YBCO薄膜刻蚀速率加快,而且除激光化学作用外,腐蚀液自身温度升高也是导致刻蚀速率加快的重要因素。A real time monitoring system based on circuit and infrared technique was designed to research the current and infrared characteristics in laser assisted chemical etching process of Yttrium Barium Copper Oxygen (YBCO) high temperature superconducting film. The important experimental results were provided to control laser power, etchant solution, etching period and temperature. The major discoveries include: large initial etching current and stable current increase as well as steep-drop points were observed in laser assisted chemical etching process, and the possible reasons were analyzed by comparing the etching current without laser radiation, too; The infrared thermo-images of etchant solution were observed to find that the etching speed was accelerated by laser radiation, which was caused by laser-chemical effect and the increased temperature ofetchant solution
关 键 词:激光辅助化学刻蚀 高温超导薄膜 钇钡铜氧 红外特性
分 类 号:TN249[电子电信—物理电子学] O511.9[理学—低温物理]
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