电感耦合等离子体原子发射光谱法测定镍硅铜中镍和铜  

Determination of nickel and copper in nickel-silicon-copper alloy by inductively coupled plasma atomic emisson spectrometry

作　　者：李韶梅[1] 石毓霞[1] 赵伟[1] 

机构地区：[1]邯郸钢铁集团有限公司技术中心,河北邯郸056015

出　　处：《冶金分析》2007年第2期79-80,共2页Metallurgical Analysis

摘　　要：建立了测定镍硅铜合金中镍和铜的电感耦合等离子体原子发射光谱(ICP-AES)法。样品用硝酸溶解,氢氟酸助熔,高氯酸冒烟除去氢氟酸,用硝酸溶解盐类后,在选定的测量条件下以ICP-AES法测定溶液中镍和铜的浓度。用本法对同一试样中镍和铜进行10次平行测定,得到相对标准偏差分别为3.29%和4.32%,加标回收率分别为101.2%和99.7%。本法的测定结果与化学法吻合。An inductively coupled plasma atomic emisson spectrometry（ICP-AES）for the determination of nickel and copper in nickel-silicon-copper alloy was built. Sample was dissolved in nitric acid, with hydrofluoric acid as flux. In order to eliminate hydrofluoric acid,perchloric acid was added and heated to evolve fumes of perchloric acid. After dissolving the salts with nitric acid, nickel and copper in the solution were determined by ICP-AES in measuring conditions selected. In application the method to the determination of nickel and copper in nickel-silicon-copper alloy samples, the relative standard deviations of 3.29% and 4.32% and the recoveries of 101.2% and 99.7% were achieved, respectively. The determination results of this method agree with those of chemical method.

关 键 词：镍硅铜合金 电感耦合等离子体原子发射光谱法 镍 铜 测定 

分 类 号：TG115.3[金属学及工艺—物理冶金]