基于AduC812单片机的等离子熔积控制系统的设计  

Design of control system based on AduC812 MCU for plasma powder deposition

作　　者：柳新来[1] 张海鸥[1] 艾辉[1] 王桂兰[1] 

机构地区：[1]华中科技大学数字制造装备与技术实验室,湖北武汉430074

出　　处：《电焊机》2007年第3期52-55,共4页Electric Welding Machine

摘　　要：在等离子熔积快速成形的强电磁干扰的恶劣环境下,采用数据采集系统芯片AduC812单片机,设计了实现采样、控制一体化的自动控制系统。通过综合采用软硬件抗干扰和信号过滤措施,使该单片机控制系统在恶劣环境下实现了稳定的数据采集和自动控制。This paper describes a data collection and control system for Metal Rapid Prototyping based on plasma power deposition. It has been designed and realized on the basic of the AduC812 micro-controller.The environment of processing of plasma power deposition is full of a lot of harmful disturb signals to AduC812.By using measurements of anti-jamming and filtrating the data collection ＆ control system avoids all disturb signal harm to MCU and works well.

关 键 词：等离子熔积 单片机 数据采集 上位机监控 

分 类 号：TG409[金属学及工艺—焊接]