Investigation of nanometer-scale films using low angle Xray reflectivity analysis in IPOE  

作　　者：WANG Zhan-shan XU Yao WANG Hong-chang ZHU Jing-tao ZHANG Zhong WANG Feng-li CHEN Ling-yan 

机构地区：[1]Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China

出　　处：《Optoelectronics Letters》2007年第2期88-90,共3页光电子快报（英文版）

基　　金：This work was supported by the National Natural Science Foun-dation of China(10435050,60378021);the National 863-804Sustentation Fund(2006AA12Z139);the Program for New Cen-tury Excellent Talents in University(NCET-04-037);the RoyalSociety,London(NC/China/16660);Tongji University scien-tific fund.

摘　　要：The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters of nanometer-scale structures,three effectual methods are presented by using X-ray reflectivity analysis to provide an accurate estimation of the nanometer film structures. The parameters of tungsten (W) single layer, such as the material density, interface roughness and deposition rate, were obtained easily and speedily. The base metal layer was introduced to measure the profiles of single low Z material film. A 0.3 nm chromium (Cr) film was also studied by low angle reflectivity analysis.

关 键 词：IPOE 纳米级薄膜 X线反射率分析 多层结构 参数 

分 类 号：O484[理学—固体物理]