光敏有机硅防粘剂的合成与性能  

Synthesis and properties of photosensitive polysiloxane release agent

作　　者：孙芳[1] 朱国强[1] 杜洪光[1] 

机构地区：[1]北京化工大学理学院,北京100029

出　　处：《辐射研究与辐射工艺学报》2007年第1期43-46,共4页Journal of Radiation Research and Radiation Processing

基　　金：国家自然科学基金(29776002)资助

摘　　要：以含氢硅油和甲基丙烯酸烯丙酯为原料,通过硅氢加成法制备了具有紫外光固化性能的聚二甲基硅氧烷丙烯酸酯防粘剂预聚体。研究了反应温度、催化剂浓度及溶剂对反应的影响,确定了最佳反应条件:反应温度为60-70℃,以三苯基膦氯化铑为催化剂,加入量为原料总重量的0.04%。利用红外光谱法表征了预聚物的结构,并考察了其感光性能及表面性能。预聚体的感度可达56.9mJ/cm2,其固化膜具有较低的表面能(γdS(H2O)=32.49mN/m)。Polysiloxane acrylate oligomer （PSAE）, which possesses UV-curing capability and release property, was synthesized by hydrosilyation reaction of polyhydrosiloxane with allyl methylacrylate. The effects of reaction temperature, catalyst concentration and solvent on the reaction were studied. It was found that the optimum synthesis temperature for PSAE was 60-70℃. Tris （Triphenylphosphine） rhodium chloride was used as catalyst with 0.04% of total amount of reactants. Structure of the oligomer was characterized by FTIR. Photosensitive and surface properties of as-synthesized PSAE were investigated. The photosensitivity of PSAE is 56.9mJ/cm^2. UV-cured film of PSAE possesses lower surface energy with γ^ds （H2O） of 32.49mN/m.

关 键 词：防粘剂 硅氢加成 丙烯酸酯 光固化 

分 类 号：TQ571[化学工程—精细化工]