合金元素(Ti,Cr,Ni)对IBAD制备的碳膜性质的影响  

Effect of alloying elements including Ti, Cr and Ni on carbon thin films prepared by IBAD

作　　者：李璞[1] 关凯书[1] 

机构地区：[1]华东理工大学化工机械研究所,上海200237

出　　处：《真空》2007年第2期27-31,共5页Vacuum

摘　　要：本文采用离子束辅助沉积技术(IBAD)制备一系列碳膜,重点分析添加合金元素(Ti,Cr,Ni)对薄膜性质的影响。实验结果表明添加Ti,Cr,Ni元素对碳膜厚度,硬度无明显影响,但提高了薄膜的结合强度,其中加入Ni后,薄膜的结合强度最好;添加合金元素可以显著减小碳膜的摩擦系数;添加Ti元素碳膜的组织以非晶态为主,与纯碳膜相当。相对于类金刚石薄膜,本实验制备的碳膜试样更接近于类石墨膜。An analysis was made focusing on the effect of alloying elements including Ti, Cr and Ni on a series of carbon thin films prepared by the ion beam assisted deposition（IBAD） system. The experimental results showed that the films with Ti, Cr or Ni addition can all enhance the bond strength, among which Ni shows the best effect. But, any of them shows unobvious effect on thickness and hardness of thin films. The films with Ti, Cr or Ni addition can obviously reduce the friction. It was observed that the films with Ti addition present mainly the amorphous structure and are equivalent to pure carbon films. All the film specimens prepared by IBAD for experiments approach GLC rather than DLC.

关 键 词：离子束辅助沉积技术(IBAD) 碳膜 结合强度 合金元素 

分 类 号：TB43[一般工业技术]