蒙特卡罗模拟单元素靶的溅射产额角分布  

Monte-Carlo Simulation of Sputtering for Angular Distribution of Sputtered Atoms from Element Targets

作　　者：李欣年[1,2] 王传珊[1,2] 罗文芸[1,2] 江炳尧[1,2] 

机构地区：[1]上海大学射线应用研究所 [2]中科院上海冶金研究所

出　　处：《上海大学学报（自然科学版）》1996年第1期12-17,共6页Journal of Shanghai University:Natural Science Edition

摘　　要：用蒙特卡罗方法模拟能量为２７ｋｅＶＡｒ＋轰击Ａｇ和Ｃｄ单元素靶的力学运动，以研究级联碰撞产生的溅射原子的空间分布情况，对计算结果进行适当的数学处理，以得出微分溅射产额角分布．计算结果和实验值作了比较，并讨论了两种单元素靶的微分产额角分布．By means of the Monte-Carlo simulation based on the binding collision approximation,this paper investigates the sputtering of Silver and Cadmium element targets bombarded by 27 keV Ar+ ions and studies the spatial distribution of sputtered atoms by collision cascade. Proper treatments of simulation results have been made to get the angular distribution of differential sputtering yields.Angular distribution of differential sputtering yields of both element targets has been discussed in accordance with a comparision of the calculated and measured results.

关 键 词：蒙特卡罗模拟 级联理论 溅射 溅射产额角分布 

分 类 号：O562.5[理学—原子与分子物理] O242.1[理学—物理]