The Characterization and Optimization of the Microcircuit Process Equipment Using Design of Experimentand Data Transformation  

作　　者：YOU Hailong JIA Xinzhang 

机构地区：[1]School of Microelectronics, Xidian University, Xi＇an 710071, China [2]Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, Xi＇an 710071, China

出　　处：《Chinese Journal of Electronics》2007年第1期69-72,共4页电子学报（英文版）

摘　　要：In the semiconductor manufacturing, the setting of the microcircuit process equipment input need be carefully chosen to make the output get as close as possible to the target and reduce the variability of the process. Design of experiment （DOE） can be used to construct the process output/input relation and optimally select the settings of input variables. In this paper, the model of thermal oxidation furnace is developed using DOE and data transformation. The equipment system involves six input factors and two responses. Using the fractional factorial experimental design, the experiment plan of only 16 run experiments is determined. The Box-Cox transformation method is used to transform the experimental data by the optimum transformation style. The responses are transformed so that the residuals meet the model assumption and the model can explore more information here. Based on the results, the models are subsequently used to optimize the thermal oxidation process. The non-uniformity of film is improved from 0.2% to 0.08% with the other specification satisfied.

关 键 词：Semiconductor manufacturing Microcircuit process equipment Design of experiment Box-Cox transformation Uniformity. 

分 类 号：TN705[电子电信—电路与系统] TN305