紫外光引发的玉米淀粉在软材料表面的改性  

UV-induced surface modification of soft polymer with corn starch

作　　者：黄振华[1] 徐晶晶[1] 杨万泰[1] 

机构地区：[1]北京化工大学新型高分子材料制备与加工重点实验室,北京100029

出　　处：《北京化工大学学报（自然科学版）》2007年第2期159-163,共5页Journal of Beijing University of Chemical Technology(Natural Science Edition)

基　　金：国家自然科学基金重点项目(50433040);北京市教委高分子化学与物理学科建设重点项目(XK100;100433)

摘　　要：以玉米淀粉作为改性剂、二苯甲酮(BP)做光引发剂对聚合物材料表面进行紫外光偶合反应,用X-射线电子能谱(XPS)、水接触角(CA)和扫描电子显微镜(SEM)对改性后的聚合物表面进行了结构和性能表征。结果表明,玉米淀粉被固定到CPP膜表面的最佳条件为0.03g/L玉米淀粉、1.0g/LBP、12.0mW/cm2光强和8min光照时间。玉米淀粉改性后的CPP膜的接触角可由105.0°变为66.3°。随着玉米淀粉的初始浓度的增加,改性CPP膜的表面水接触角先随之下降然后略有上升;延长光照时间和增加光强均会使玉米淀粉改性的CPP膜的表面水接触角随之下降。玉米淀粉改性后的CPP膜的表面形成了一定规则形状的颗粒结构。Corn starch has been used for the surface modification of a cast polypropylene （CPP） polymer surface using benzophenone （BP） as photoinitiator. The modified polymer surfaces were characterized by X-ray photoelectron spectroscopy （XPS）, water contact angle （CA） and scanning electron microscopy （SEM）. It was found that the optimal conditions for preparing corn starch modified CPP film are concentrations of 0.03 g/L for corn starch and 1.0 g/L for BP, with a photointensity of 12.0 mW/cm^2 for a time of 8 min. The contact angle of the CPP surface was reduced from 105.0° to a minimum of 66.3° after modification with corn starch. The contact angle was found to reach a minimum value at intermediate starch concentrations and after prolonged irradiation times and high photointensities. Spontaneous formation of small granules of corn starch on the modified CPP surface were observed by SEM.

关 键 词：玉米淀粉 紫外光偶合 亲水性 

分 类 号：TQ316.312[化学工程—高聚物工业]