硫脲对电沉积纳米晶镍的影响  

Effect of Thiourea on Nanocrystalline Nickel by Electrodeposition

作　　者：许姣姣[1] 司云森[1] 

机构地区：[1]昆明理工大学材料与冶金工程学院,云南昆明650093

出　　处：《云南化工》2007年第2期17-19,共3页Yunnan Chemical Technology

摘　　要：采用直流电沉积法制备了纳米晶镍,用X射线衍射和阴极极化曲线的测定对比研究了硫脲对沉积层晶粒尺寸以及阴极过电位的影响。结果表面,添加适量的硫脲,能够增大阴极极化,使镍沉积层晶粒尺寸变小。另外,沉积层的择优取向不随硫脲浓度的变化而改变。Nanocrystalline nickel was synthesized by direct current electrodeposition, and effect of thiourea on grain size of settled layer and cathode overpotential was studied by X - Ray diffraction and cathodic polarization curve. Result showed that cathode overpotential remarkably increased and crystal grains decreased with the addition of appropriate thiourea. The preferred orientation of settled nickel layer didnt change with the concentration of thiourea.

关 键 词：电沉积 纳米晶镍 硫脲 阴极过电位 

分 类 号：TQ153.1[化学工程—电化学工业]