氧化钨薄膜电致变色状态下物相组份及表面形貌变化的研究  

STUDY ON THE PHASE,COMPOSITION AND SURFACE MORPHOLOGY CHANGES OF WO x FILM IN ELECTROCHROMIC STATES

作　　者：王晓光[1] 江月山[1] 杨乃恒[1] 袁磊[2] 庞世瑾[2] 

机构地区：[1]东北大学真空工程系 [2]中国科学院北京真空物理开放实验室

出　　处：《太阳能学报》1997年第1期46-50,共5页Acta Energiae Solaris Sinica

摘　　要：通过对直流磁控溅射方法得到ＷＯｘ膜层的电化学和光学性能测试，以及ＸＲＤ和ＳＴＭ的物相、形貌分析，发现该ＷＯｘ膜层具有良好的电致变色性能，原始沉积态ＷＯｘ膜层为非晶态，其着退色状态仍为非晶特性，而晶态ＷＯｘ膜层在着色态和退色态之间发生物相组份的可逆变化，且表面形貌有很大差异。WO x electrochromic (EC) films obtained by DC magnetron sputtering technique were investigated by XRD and STM measurements.The reversible phases changes of c WO x film between the bleached and colored states are revealed.The study results indicate that the amorphous as deposited WO x film(a WO x)is of amorphous microstructure both in the bleached and colored states.However,the crystal WO x(c WO x) is stoichiometric triclinic lattice WO 3 in bleached state,and would change into nonstoichiometry tetragonal lattice H 0.33 WO 3 in colored state.The surface morphology of colored c H 0.33 WO 3 film is very different from that of the bleached WO 3 film.

关 键 词：电致变色 物相组份 表面形貌 薄膜 氧化钨 

分 类 号：TN304.21[电子电信—物理电子学]