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作 者:李爱昌[1] 傅丽[1] 龙运前[1] 王芳[1] 梁东旺[1] 董玲[1]
出 处:《材料保护》2007年第4期32-34,共3页Materials Protection
摘 要:采用复合电沉积法制备了TiO2质量分数为20.86%的Sn-TiO2纳米薄膜,研究了阴极电流密度、镀液温度、TiO2微粒的悬浮量等因素对薄膜中TiO2含量的影响,采用扫描电子显微镜(SEM)、X射线衍射(XRD)对热处理后的SnO2-TiO2复合薄膜进行了表征,以甲基橙为模型化合物对薄膜的光催化性能进行了测定。结果表明,在最佳工艺下所得复合纳米薄膜具有优异的光催化活性。Sn-TiO2 nanofilm containing 20.86% TiO2(mass fraction) was prepared by means of composite electroplating.The effects of cathodic current density,bath temperature,and concentration of TiO2 particles suspended in the plating bath on the codeposition amount of TiO2 in the composite film were investigated. The surface morphology and structure of the SnO2-TiO2 film were characterized by means of scanning electron spectroscopy and X-ray diffraction.The photocatalytic behavior of the SnO2-TiO2 film was evaluated using methyl orange as a model compound.The results showed that the SnO2-TiO2 composite film had a high photocatalytic activity.
关 键 词:光催化剂 Sn—TiO2纳米膜 复合电沉积法 性能 表征
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