高岭石/N-氧化吡啶插层复合物的制备及其机理分析  

Preparation and Mechanism Analyses of Kaolinite/Pyridine N-oxide Compound

作　　者：顾晓文[1] 张先如[1] 徐政[1] 

机构地区：[1]同济大学材料科学与工程学院,上海200092

出　　处：《材料科学与工程学报》2007年第2期253-257,共5页Journal of Materials Science and Engineering

基　　金：国家自然科学基金资助项目(50372045)

摘　　要：以高岭石/DMSO插层复合物作为前驱体,在微波辐射下成功制备了高岭石/N-氧化吡啶插层复合物,采用X-射线衍射、FT-IR光谱等技术对产物进行表征。实验结果表明:在高岭石/N-氧化吡啶插层复合物中,高岭石的层间距扩张到1.251nm,插层率达到了72.2%。在此基础上,进一步分析N-氧化吡啶插层高岭石的作用机理,即N-氧化吡啶分子中的N-O基团与高岭石的内表面羟基形成了氢键,N-氧化吡啶分子以单分子层形式近似垂直排列于高岭石层间。Using a kaolinite/DMSO intercalation compound as a precursor, a kaolinite/pyridine N-oxide intercalation compound was prepared by microwaves. The product was characterized by XRD and FT-IR. The results show that the basal spacing of kaolinite/pyfidine N-oxide intercalation compound is 1.251nm. The apparent intercalation of the product reaches 72.2%. According to that, mechanism analyses of pyridine N-oxide intercalating kaolinite were provided in the paper. The N-O group of pyridine N-oxide hydrogen-bonded to the inner surface hydroxyls of the kaolinite. The pyridine N-oxide was appeared to be in an approximately perpendicular position and formed a single layer in the lamination of kaolinite.

关 键 词：高岭石 N-氧化吡啶 插层机理 

分 类 号：TB332[一般工业技术—材料科学与工程] TP273[自动化与计算机技术—检测技术与自动化装置]