微透镜列阵的离子束刻蚀及衍射效率测量  

Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency

作　　者：赵光兴[1] 杨国光[1] 陈洪璆 侯西云 

机构地区：[1]浙江大学光科系,杭州310027

出　　处：《中国激光》1997年第1期35-40,共6页Chinese Journal of Lasers

摘　　要：采用Kaufman离子源刻蚀微透镜列阵并采用实时检测系统对刻蚀深度进行了控制。提出了测量微透镜列阵衍射效率的一种方法。对测量误差进行了讨论。A binary optics microlens array (BM) was fabricated by using ion beam etching. The real-time test of etching depth in vacuum enviroment was performed. A noval method of measuring the BM diffraction efficiency was presented.

关 键 词：微透镜列阵 离子束刻蚀 衍射效率 激光技术 

分 类 号：TN24[电子电信—物理电子学]